Base is a peer-reviewed spanish-language open-access journal published by Universidad del Desarrollo in Chile, operating under an open-access model since 2021. The journal covers Education, Architecture: Architectural drawing and design, and Social Sciences.
Authors publish in Base without paying any article processing charge (APC) — making it a fully diamond/platinum open-access venue, supported entirely by its publisher or sponsor. Articles are released under the CC BY-NC-ND license (see other journals using this license).
To date, Base has published 69 articles. Articles are minted with DOIs through the prefix 10.52611.
Keywords
design innovation, design education, design methods, social innovation, sustainable design
At a glance
- Publisher
- Universidad del Desarrollo
- Country
- Chile
- Primary language
- Spanish
- License
- CC BY-NC-ND
- Peer review
- Double anonymous peer review
- OA since
- 2021
- Review time
- 42 weeks
- DOI prefix
10.52611
ISSN
- 0719-515X
- electronic
- 2452-5928
Manuscript languages
Frequently asked questions
Is Base peer-reviewed?
Yes — Base operates a Double anonymous peer review review process.
Does Base charge an article processing charge (APC)?
No. Base does not charge any APC. Publication is free for accepted authors.
What subjects does Base publish?
Base publishes research in Education, Architecture: Architectural drawing and design, and Social Sciences.
What languages does Base accept?
Base accepts manuscripts in English and Spanish.
What is the ISSN of Base?
ISSN:
0719-515X (print) · 2452-5928 (electronic).How do I submit a manuscript to Base?
Submit through the journal's official portal: visit submission page →
How long does peer review take at Base?
Average time from submission to publication is approximately 42 weeks.