Journal of Technological and Space Plasmas is a peer-reviewed english-language open-access journal published by Gruenwald Laboratories GmbH in Austria, operating under an open-access model since 2020. The journal covers Physics: Electricity and magnetism: Electricity: Plasma physics. Ionized gases and Engineering (General). Civil engineering (General): Plasma engineering. Applied plasma dynamics.
Authors are required to pay an article processing charge to publish in Journal of Technological and Space Plasmas; refer to the journal's APC page for the current rate. Articles are released under the CC BY license (see other journals using this license).
To date, Journal of Technological and Space Plasmas has published 41 articles. Articles are minted with DOIs through the prefix 10.31281. All submissions undergo plagiarism screening before peer review.
Keywords
plasma, plasma physics, space science, astrophysics
At a glance
- Publisher
- Gruenwald Laboratories GmbH
- Country
- Austria
- Primary language
- English
- License
- CC BY
- Peer review
- Anonymous peer review
- OA since
- 2020
- Review time
- 11 weeks
- DOI prefix
10.31281- Plagiarism check
- Yes
ISSN
- electronic
- 2616-647X
Frequently asked questions
Is Journal of Technological and Space Plasmas peer-reviewed?
Does Journal of Technological and Space Plasmas charge an article processing charge (APC)?
What subjects does Journal of Technological and Space Plasmas publish?
What languages does Journal of Technological and Space Plasmas accept?
What is the ISSN of Journal of Technological and Space Plasmas?
2616-647X (electronic).