Revista Processus de Políticas Públicas e Desenvolvimento Social is a peer-reviewed portuguese-language open-access journal published by Editora Processus in Brazil, operating under an open-access model since 2019. The journal covers Political science, Law, and Social Sciences.
Authors publish in Revista Processus de Políticas Públicas e Desenvolvimento Social without paying any article processing charge (APC) — making it a fully diamond/platinum open-access venue, supported entirely by its publisher or sponsor. Articles are released under the CC BY license (see other journals using this license).
Keywords
public policy, social development
At a glance
- Publisher
- Editora Processus
- Country
- Brazil
- Primary language
- Portuguese
- License
- CC BY
- Peer review
- Double anonymous peer review
- OA since
- 2019
ISSN
- electronic
- 2675-0236
Manuscript languages
Frequently asked questions
Is Revista Processus de Políticas Públicas e Desenvolvimento Social peer-reviewed?
Yes — Revista Processus de Políticas Públicas e Desenvolvimento Social operates a Double anonymous peer review review process.
Does Revista Processus de Políticas Públicas e Desenvolvimento Social charge an article processing charge (APC)?
No. Revista Processus de Políticas Públicas e Desenvolvimento Social does not charge any APC. Publication is free for accepted authors.
What subjects does Revista Processus de Políticas Públicas e Desenvolvimento Social publish?
Revista Processus de Políticas Públicas e Desenvolvimento Social publishes research in Political science, Law, and Social Sciences.
What languages does Revista Processus de Políticas Públicas e Desenvolvimento Social accept?
Revista Processus de Políticas Públicas e Desenvolvimento Social accepts manuscripts in English, Portuguese, and Spanish.
What is the ISSN of Revista Processus de Políticas Públicas e Desenvolvimento Social?
ISSN:
2675-0236 (electronic).How do I submit a manuscript to Revista Processus de Políticas Públicas e Desenvolvimento Social?
Submit through the journal's official portal: visit submission page →